AEROSOL REACTORS FOR THIN FILM DEPOSITION AND THEIR APPLICATION TO ZnS:CI DOPED FILMS

INTRODUCTION Thin films of different materials like metals, oxides, sulphides, etc., can be deposited by the Chemical Aerosol Deposition Technology (CADT). A liquid aerosol is used to transport the chemical reactants to the vicinity of a heated subslrate. Conditions are set to obtain an heterogeneous reaction (CVD mode) between the evaporated reactants and the substrate (Maatman et al. 1988). The quality of the films is therefore comparable to those made by CVD or MOCVD with the advantage of being an inexpensive technique. Two different aerosol reactors have been used to deposit ZnS:CI thin films: an stagnation point flow reactor and a hot wall vertical aerosol reactor.